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Stencils for Resistless Patterning

stencils
Our microsieve membranes can very well be used in experiment set-ups where material is deposited through a mask (stencilling or shadow mask patterning). Because of the regular pattern in (sub) µm regime, the stencil can help you to step into the nano-domain.

Perforated Stencils
Dimensions 5 * 5 mm, 0.6 mm thickness
Pore size:
500 nm
1.2 µm

Custom Membranes
On request we also make unperforated silicon nitride membranes that you can use for your patterning experiments. The membranes can easily be perforated using focussed ion beam (FIB) milling to obtain stencils with features down to 20nm.